We are pleased to announce that the following two papers have been accepted for publication in Japanese Journal of Applied Physics (JJAP).
Oshima’s paper is a joint work with AIST.
- Kyohei Shimozato, Yohei Nakamura, Song Bian, and Takashi Sato, “An electrothermal compact model of SiC MOSFETs for analyzing avalanche failure mechanism,” Japanese Journal of Applied Physics (JJAP), (to appear) doi: 10.35848/1347-4065/abdc5c .
- Kunihiro Oshima, Song Bian, Kazunori Kuribara, and Takashi Sato, “Separation of bias stress degradation factors in organic thin-film transistors,” Japanese Journal of Applied Physics (JJAP), (to appear) doi: 10.35848/1347-4065/abdcb2 .