Oshima (M2) received the IEEE Kansai Chapter MFSK Award at the 20th IEEE Kansai Colloquium on Electronic Devices held online on November 27. The awarded presentation is as follows.
- Experimental study of bias stress degradation of organic thin filmtransistors [SSDM],
K. Oshima, M. Saito, M. Shintani, K. Kuribara, Y. Ogasahara, and T. Sato. -
