IEEE Kansai Chapter MFSK Award

Oshima (M2) received the IEEE Kansai Chapter MFSK Award at the 20th IEEE Kansai Colloquium on Electronic Devices held online on November 27. The awarded presentation is as follows.

  • Experimental study of bias stress degradation of organic thin filmtransistors [SSDM],
    K. Oshima, M. Saito, M. Shintani, K. Kuribara, Y. Ogasahara, and T. Sato.
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