Japanese Journal of Applied Physics (JJAP)への以下の論文の採録が決定しました．
本成果は産総研との共同研究によるものです．
- Kunihiro Oshima, Michihiro Shintani, Kazunori Kuribara, Yasuhiro Ogasahara, and Takashi Sato, “Recovery-aware bias-stress degradation model for organic thin-film transistors considering drain and gate bias voltages,” Japanese Journal of Applied Physics (JJAP), (accepted for publication).